Please use this identifier to cite or link to this item: http://localhost:8080/xmlui/handle/123456789/3040
Title: The electrical characterization of p-CdTe/n-Si (111) heterojunction diode
Authors: Razooqi, Mohammed A
Abdulameer, Ameer F
Hameed, Adwan N
Abdullaha, Rasha A
Sabbar, Ehsan I
Keywords: Island nucleation
Submonolayer growth
Anomalous diffusion
Critical island size
Issue Date: Jul-2012
Publisher: Advanced Materials Research Vol. 702
Abstract: Abstract: p-CdTe film has been deposited on n-Si (111) substrate by thermal evaporation technique. The prepared CdTe/Si heterojunction diodes have been annealed at 573K. The capacitance-voltage measurements have studied for the prepared heterojunctions under 2 KHz frequencies. The capacitance-voltage measurement indicated that these diodes are abrupt. The capacitance at zero bias, the built in voltage and the doping concentration increased after annealing process while the zero bias depletion region width is decreased. The carrier transport mechanism for CdTe/Si diodes in dark is tunneling-recombination. From current-voltage measurement at dark, the values of ideality factor are 2.9 and 3.8. The values of reverse saturation current are 3.77× 10-7 and 9.36× 10-8 Amperes.
URI: http://localhost:8080/xmlui/handle/123456789/3040
Appears in Collections:الهندسة الكهربائية

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